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One nm wavelength? So this could be used as a source for photolithography?

discuss

6SixTy|1 year ago

Far as I know, X-Ray lithography is even harder than EUV. Mostly because optical manipulation of X Rays barely exist, and X Rays only interact with heavier elements.

unknown|1 year ago

[deleted]

phkahler|1 year ago

Current EUV sources from ASML are 13.5nm IIRC. It's increasingly difficult to do any kind of optics (focusing, masks, or even mirrors) at shorter wavelength.